Fabrication of flexible organic field effect transistors and phototransistors
Laboratory for thin film technology
This vacuum system is composed of two magnetron sputtering sources, 2 inches in diameter, both for soichiometric targets, one for Al and theother for Al2O3. 88% thickness uniformity on 3-inch substrates is achieved.This vacuum system is composed of two magnetron sputtering sources, 2 inches in diameter, both for soichiometric targets, one for Al and theother for Al2O3. 88% thickness uniformity on 3-inch substrates is achieved.
The vacuum system consists of a 1 cm thick heatable copper base. The substrate, with a maximum size of 3 inches, is placed on it. The temperature can be stabilized in the range 0-150 1 °C. The organic film, typically 30-50 nm thick, is evaporated via a Knudsen source.
Multilayer fabrication steps
Laboratory of electrical and optical characterization
